CMP Equipment for the Highest Demands in Semiconductor Manufacturing

What is CMP (Chemical Mechanical Planarization)?

CMP — Chemical Mechanical Planarization — is a key process to create smooth, planar surfaces on semiconductor wafers. Especially for low-k materials or material stacks with varying hardness, CMP is indispensable, as purely mechanical methods would cause steps or defects.

Why Choose ACCRETECH CMP Systems?

Our ChaMP series CMP machines offer:

  • Superior surface quality through precise polishing technology
  • Modular design for maximum flexibility
  • Automated processes with integrated wafer handling and cleaning

CMP – For ≤ 200 mm Wafer

CMP – For ≤ 300 mm Wafer

ChaMP 211/232: Compact and designed for high-end processes with maximum process control
Learn more about ChaMP 211/232 →

ChaMP 332: Fully automatic for high-end processes with maximum process control
Learn more about ChaMP 332 →

Benefits of Our CMP Systems at a Glance

  • Highest process stability
  • Integratable wafer loaders and cleaning units
  • User-friendly control
  • Maintenance-friendly design
  • European service and support

Our CMP Systems are Designed for

  • Semiconductor manufacturers
  • MEMS production
  • Research institutes
  • Contract manufacturers (foundries)

Whether you want to modernize your production line or set new standards — with ACCRETECH’s CMP solutions, you achieve the next level of planarization.