ChaMP 211/232: The CMP tool for 8" wafer

ChaMP 211/232

High Performance CMP Technology for wafers up to 200mm

Maximum Process Safety

Optimum Interaction of all Components

Outstanding Results

Can be configured for high volumes

Modular, flexible and compact design
Dry in Dry Out with cleaning option
Polishing head with Air Float Technology
Easy Maintenance
End Point Detection (EPD) for high precision and even polishing
Processed Cu / STI/ ILD / SOI etc.
For ChaMP 232, also with 3 polishing tables and 2 polishing heads – ideal for mass production

ChaMP 211 Layout

ChaMP 232 Layout

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