High-Performance CMP Systems for Wafers up to 200 mm

ChaMP 211 / 232

The ChaMP 211/232 series from Accretech offers precise and reliable CMP machines specifically designed to meet the requirements of 200 mm wafer manufacturing. Modular, compact, and flexible – ideal for process reliability and excellent surface quality.

Request more information about ChaMP 211/232

Your Advantages at a Glance

Maximum process reliability thanks to the optimal interaction of all components
Modular and compact design for easy integration into your production line
Polishing head with Air-Float technology for gentle and uniform polishing
End Point Detection (EPD) for highly precise, reproducible polishing
Dry-in/Dry-out process with cleaning option for contamination-free wafer transfer
Easy maintenance thanks to well-thought-out system design

Who is the ChaMP 211/232 Series Suitable For?

Semiconductor manufacturers with 200 mm wafer lines
Production sites focused on process reliability and surface quality
Development departments and foundries

Request more information about ChaMP 211/232

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